PhotoMark® eIonomer

PhotoMark® eIonomer™ is a thermoplastic encapsulant that offers excellent strength, UV resistance and high bond to cells, glass and substrates, including PET.

This product reduces lamination cycle time and minimizes moisture ingress. An ionomer of ethylene acid copolymer, it has a proven track record as an encapsulant for CIGS technology in thin film PV applications. Users benefit from its excellent isolation performance, electrical resistivity, rigidity and durability.

PhotoMark® eIonomer has a wide variety of performance features, including:

  • Reduced cycle time versus PVB or EVA
  • Low moisture pickup, diffusion coefficients and moisture equilibrium levels
  • Excellent laminated transparency
  • Superior hydrolysis and microbial resistance
  • Medium durometer and modulus
  • No Potential Induced Degradation (PID)
  • No degradation of polymer forming acetic acid
  • Exceptional low-temperature flexibility
  • Outstanding cold impact

Relying on its two-decade history in PV innovation, Tomark-Worthen has created this breakthrough product. Based on known materials that have excellent track records in outdoor applications and provide excellent laminator qualities, PhotoMark® eIonomer™ will help make your panel more reliable and competitive.

Composition: Zinc lonomer

Density 0.95g/cm³
Melting Point, DSC 93ºC (199ºF)
Freezing Point, DSC 64ºC (147ºF)
Vicat Softening Point 65ºC (149ºF)
Max Processing Temp 260ºC (500ºF)
Haze >2.5 %
Light Transmittance 93 %
Refractive Index 1.5
Tensile Strength, Mpa/kpsi 24.1, 3.5
Tensile Modulus, Mpa/kpsi 291, 42.3

For more information on this product, contact us using the form below.